Defects in neutron transmutation doped silicon studied by positron annihilation lifetime measurements

Michèle Coeck, N. Balcaen, Toon van Hoecke, B. Van Waeyenberge, D. Segers, Charles Dauwe, Christiane Laermans

    Research outputpeer-review

    Abstract

    Neutron transmutation doping of n-type silicon was obtained by irradiating the samples with thermal neutrons in order to create P atoms. Positron lifetime measurements were carried out and the evolution of the induced defects was studied by thermal annealing of the samples. The annealing out of the divacancy was seen between 200 and 350°C. Around 700°C large vacancy clusters (containing about eight vacancies) are formed. All the defects are annealed above 800°C.

    Original languageEnglish
    Pages (from-to)3674-3677
    Number of pages4
    JournalJournal of Applied Physics
    Volume87
    Issue number8
    DOIs
    StatePublished - 15 Apr 2000

    ASJC Scopus subject areas

    • General Physics and Astronomy

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