Depth profiling of the modification induced by high-flux deuterium plasma in tungsten and tungsten-tantalum alloys

Yevhen Zayachuk, Armin Manhard, M.H.J. 't Hoen, Wolfgang Jacob, P.A. Zeijlmans van Emmichoven, Guido Van Oost

    Research outputpeer-review

    27 Scopus citations


    The present work reports the results of an experimental study of the depth distribution and fluence dependence of deuterium plasma-induced material modification of tungsten and tungsten-tantalum alloys. Plasma-induced damage was created by exposure to high-flux deuterium plasma in the plasma generator Pilot-PSI, followed by the degassing and subsequent decoration of created defects with deuterium by another plasma exposure. The depth distribution of deuterium from the decorating exposure reflects the distribution of plasma-induced defects. Depth profiling of this decorating deuterium, was performed by nuclear reaction analysis. It was found that plasma-induced material modification, which manifested itself as an increase of the deuterium concentration in the samples pre-exposed with high-flux plasma in comparison to the samples without such pre-exposure extends down to more than 5μm from the surface. This increase features a tendency to saturation with increasing fluence of the damaging high-flux plasma. Over the entire probing range, with the exception of the narrow surface region and the deep region beyond 5μm, the deuterium content is lower in pre-exposed W-Ta than in similarly pre-exposed W. Sub-surface features formed as a result of high-flux plasma exposure were studied with the help of focused ion beam cross-sectioning. W was found to contain plasma-induced cavities down to much larger depth than W-Ta.

    Original languageEnglish
    Article number123013
    Number of pages6
    JournalNuclear Fusion
    Issue number12
    StatePublished - 1 Dec 2014

    ASJC Scopus subject areas

    • Nuclear and High Energy Physics
    • Condensed Matter Physics

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