Diseño e implementación de un reactor de deposición química de vapor para producir películas delgadas

Mauricio Arroyave, Juan Manuel Jaramillo, Mónica P. Arenas, Clarita Saldarriaga Vargas, J. Jaramillo, V. Londono

Research outputpeer-review

Abstract

This work presents the development and implementation of a Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor. The reactor construction was made from the design of each subsystem: vacuum generation stage, power supply to the discharge, ion extraction stage, gas system and heating of the substrates. The power applied to generate the discharge, essential for this type of reactor, was obtained from a microwave oven in which the magnetron is coupled to a waveguide and a resonant cavity. Some preliminary results, with the implemented reactor, were reported, which essentially consists in DLC coatings (Diamond Like Carbon) on polished silicon substrates. The coatings were characterized by atomic force microscopy-AFM and Raman spectroscopy. The results show that it is possible to obtain various amorphous molecular carbon forms. For this reason, the implementation of an inexpensive PECVD reactor is an alternative in developing research of new materials.

Translated title of the contributionDevelopment and implementation of a chemical vapor deposition reactor to obtain thin films
Original languageSpanish
Pages (from-to)85-91
Number of pages7
JournalIngeniare
Volume23
Issue number1
DOIs
StatePublished - 1 Jan 2015

ASJC Scopus subject areas

  • General Engineering

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