TY - JOUR
T1 - Effects of high pressure thermal treatments in oxygen and helium atmospheres on amorphous silicon dioxide and its radiation hardness
AU - Nuccio, L.
AU - Agnello, S.
AU - Boscaino, R
AU - Brichard, Benoît
A2 - Van Uffelen, Marco
N1 - Score = 10
PY - 2009/5
Y1 - 2009/5
N2 - The effects of thermal treatments at 400 °C in oxygen or helium atmospheres at 180 bar on the radiation
hardness of amorphous SiO2 are studied. The generation efficiency of several point defects under c
irradiation is compared to that of the untreated material. All the effects on point defects generation here
observed can be explained in terms of changes in the precursor sites. In particular it has been observed
that the thermal treatments can change the precursors sites of point defects both through temperature
and pressure related processes, not depending on the atmosphere, and through oxygen related processes
creating oxygen excess sites. The presence of dissolved oxygen also inhibits some hydrogen related processes,
as the generation of H(I) centers, probably by activating different reactions paths for hydrogen.
AB - The effects of thermal treatments at 400 °C in oxygen or helium atmospheres at 180 bar on the radiation
hardness of amorphous SiO2 are studied. The generation efficiency of several point defects under c
irradiation is compared to that of the untreated material. All the effects on point defects generation here
observed can be explained in terms of changes in the precursor sites. In particular it has been observed
that the thermal treatments can change the precursors sites of point defects both through temperature
and pressure related processes, not depending on the atmosphere, and through oxygen related processes
creating oxygen excess sites. The presence of dissolved oxygen also inhibits some hydrogen related processes,
as the generation of H(I) centers, probably by activating different reactions paths for hydrogen.
KW - Optical spectroscopy Defects Luminescence FTIR measurements Raman spectroscopy Silica
UR - http://ecm.sckcen.be/OTCS/llisapi.dll/open/ezp_103195
UR - http://knowledgecentre.sckcen.be/so2/bibref/6613
U2 - 10.1016/j.jnoncrysol.2008.11.030
DO - 10.1016/j.jnoncrysol.2008.11.030
M3 - Article
SN - 0022-3093
VL - 355
SP - 1046
EP - 1049
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
IS - 18-21
ER -