Evaporation par bombardement électronique de métaux à hauts points de fusion

A description is given of different types of small and simpleelectron guns which may be used for the preparation of metallic films. The conditions under which vanadium, niobium, Silicon, chromium and boron may be evaporated by electron bombardment are given. Prior to the evaporation the metals should be degassed thoroughly in order to prevent projections. Different parameters e.g. power of the gun, direction of bombarding and of metal deposition, and the distances gun-metal and metaI-deposit, which influence the metaIlization process, have been determined empirically.
Advantages of this method are the high temperatures obtainable at a local spot and the possibility of heating to high temperatures without contamination by the crucible.