Radiation damage studies of strain-engineered and high-mobility deep submicrometer MOSFETs

Eddy Simoen, Sofie Put, Marco Van Uffelen, Paul Leroux, Cor Claeys, H Ohyama, R Kulkarni, R.D. Schrimpf, K.F. Galloway, Marc Schyns

    Research outputpeer-review

    Abstract

    An overview is given about the total dose radiation response of deep submicrometer CMOS technologies, implementing strain or mobility engineering. It will be shown that while the total dose hardness reaches acceptable levels from a viewpoint of space applications, some new degradation mechanisms have been identified, which will be discussed.
    Original languageEnglish
    Title of host publicationProc. 8th Int. Workshop on Radiation Effects on Semiconductor Devices for Space Applications
    Place of PublicationJapan
    Pages67-72
    StatePublished - Dec 2008
    EventInt. Workshop on Radiation Effects on Semiconductor Devices for Space Applications - Tsukuba
    Duration: 15 Dec 200815 Dec 2008

    Conference

    ConferenceInt. Workshop on Radiation Effects on Semiconductor Devices for Space Applications
    Country/TerritoryJapan
    CityTsukuba
    Period2008-12-152008-12-15

    Cite this