X-ray microlithography with a transition radiation source

Research output › peer-review

Original language	English
Pages (from-to)	327-330
Number of pages	4
Journal	Microelectronic Engineering
Volume	13
Issue number	1-4
DOIs	https://doi.org/10.1016/0167-9317(91)90104-L
State	Published - Mar 1991

ASJC Scopus subject areas

@article{b40763cfa86d459ea7d5d3d48c7f3e72,

title = "X-ray microlithography with a transition radiation source",

author = "P. Goedtkindt and Salom{\'e}, \{J. M.\} and X. Artru and P. Dhez and N. Maene and F. Poortmans and L. Wartski",

year = "1991",

month = mar,

doi = "10.1016/0167-9317(91)90104-L",

language = "English",

volume = "13",

pages = "327--330",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "1-4",

}

TY - JOUR

T1 - X-ray microlithography with a transition radiation source

AU - Goedtkindt, P.

AU - Salomé, J. M.

AU - Artru, X.

AU - Dhez, P.

AU - Maene, N.

AU - Poortmans, F.

AU - Wartski, L.

PY - 1991/3

Y1 - 1991/3

UR - https://www.scopus.com/pages/publications/0026116522

U2 - 10.1016/0167-9317(91)90104-L

DO - 10.1016/0167-9317(91)90104-L

M3 - Article

AN - SCOPUS:0026116522

SN - 0167-9317

VL - 13

SP - 327

EP - 330

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4

ER -