X-ray photoelectron spectroscopy characterization of CNx thin films deposited by electron beam evaporation and nitrogen ion bombardment

Peter Petrov, Dimitar B. Dimitrov, Vesselin I. Krastev, Christo G. Georgiev, Cyril Popov

Research outputpeer-review

Abstract

Carbon nitride thin films have been deposited on Si(100) substrates by electron beam evaporation of graphite and simultaneous low energy nitrogen ion bombardment. The layers were analyzed by X-ray photoelectron spectroscopy. The synthesized layers are tetrahedrally bonded and amorphous, consisting of sp3-coordinated carbon with one nitrogen atom between its nearest neighbors. About 27% of the nitrogen is in C-N bonds and some nitrogen is in C triple bond N bonds.

Original languageEnglish
Pages (from-to)562-565
Number of pages4
JournalDiamond and Related Materials
Volume9
Issue number3
DOIs
StatePublished - 2000
Externally publishedYes
Event1999 - 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide - Prague
Duration: 12 Sep 199917 Sep 1999

Funding

This work was supported by the Bulgarian National Science Foundation (contract no. 540) and INCO–COPERNICUS Program, Contract SUPERCN, ERBIC 15CT 960757.

FundersFunder number
Not added540
Not addedERBIC 15CT 960757

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • General Chemistry
    • Mechanical Engineering
    • General Physics and Astronomy
    • Materials Chemistry
    • Electrical and Electronic Engineering

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