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X-ray photoelectron spectroscopy characterization of CNx thin films deposited by electron beam evaporation and nitrogen ion bombardment

  • Peter Petrov
  • , Dimitar B. Dimitrov
  • , Vesselin I. Krastev
  • , Christo G. Georgiev
  • , Cyril Popov

Research outputpeer-review

Abstract

Carbon nitride thin films have been deposited on Si(100) substrates by electron beam evaporation of graphite and simultaneous low energy nitrogen ion bombardment. The layers were analyzed by X-ray photoelectron spectroscopy. The synthesized layers are tetrahedrally bonded and amorphous, consisting of sp3-coordinated carbon with one nitrogen atom between its nearest neighbors. About 27% of the nitrogen is in C-N bonds and some nitrogen is in C triple bond N bonds.

Original languageEnglish
Pages (from-to)562-565
Number of pages4
JournalDiamond and Related Materials
Volume9
Issue number3
DOIs
StatePublished - 2000
Externally publishedYes
Event1999 - 10th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide - Prague
Duration: 12 Sep 199917 Sep 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • General Chemistry
  • Mechanical Engineering
  • General Physics and Astronomy
  • Materials Chemistry
  • Electrical and Electronic Engineering

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